Double patterning in nanoimprint lithography

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• 作者：Makoto Okada ; Hiroto Miyake ; Shuso Iyoshi ; Takao Yukawa ; Tetsuya Katase ; Katsuhiko Tone ; Yuichi Haruyama ; Shinji Matsui
• 关键词：Nanoimprint lithography (NIL) ; Double patterning ; UV nanoimprinting ; Room-temperature nanoimprinting
• 刊名：Microelectronic Engineering
• 出版年：2013
• 出版时间：December, 2013
• 年：2013
• 卷：112
• 期：Complete
• 页码：139-142
• 全文大小：1329 K

文摘

Nanoimprint lithography (NIL) is a simple fabrication process used to produce nanostructured devices with high resolution, high throughput and at low cost. The resolution of the mold pattern determines the resolution of the imprint pattern obtained. Thus, to improve the resolution of the nanostructures attainable by NIL, new methods are required to produce higher-resolution molds. In photolithography, double patterning significantly enhances the resolution of the nanoscale features. We demonstrate the use of double patterning nanoimprinting using ultraviolet and room-temperature-NIL resin systems. This paves the way toward a much greater variety of higher-resolution NIL products.