High-rate deposition of photocatalytic TiO2 films by oxygen plasma assist reactive evaporation method
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- 作者：Tetsuya Sakai ; Yuji Kuniyoshi ; Wataru Aoki ; Sho Ezoe ; Tatsuya Endo ; Yoichi Hoshi
- 关键词：Titanium dioxide ; Photocatalytic ; Hydrophilicity ; Organics-decomposition ; Oxygen plasma assisted reactive evaporation (OPARE) method
- 刊名：Thin Solid Films
- 出版年：2008
- 出版时间：1 July 2008
- 年：2008
- 卷：516
- 期：17
- 页码：5860-5863
- 全文大小：339 K
文摘
High-rate deposition of titanium dioxide (TiO2) film was attempted using oxygen plasma assisted reactive evaporation (OPARE) method. Photocatalytic properties of the film were investigated. During the deposition, the substrate temperature was fixed at 400 °C. The film deposition rate can be increased by increasing the supply of titanium atoms to the substrate, although oversupply of the titanium atoms causes oxygen deficiency in the films, which limits the deposition rate. The film structure depends strongly on the supply ratio of oxygen molecules to titanium atoms O2/Ti and changes from anatase to rutile structure as the O2/Ti supply ratio increased. Consequently, the maximum deposition rates of 77.0 nm min− 1 and 145.0 nm min− 1 were obtained, respectively, for the anatase and rutile film.