The effects of carrier gas and substrate temperature on ZnO films prepared by ultrasonic spray pyrolysis
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文摘
ZnO films were deposited on glass substrates in the temperature range of 350-470 ¡ãC under an atmosphere of compressed air or nitrogen (N2) by using ultrasonic spray pyrolysis technique. Structural, electrical and optical properties of the ZnO films were investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), electrical two-probe and optical transmittance measurements. The ZnO films deposited in the range of 350-430 ¡ãC were polycrystalline with the wurtzite hexagonal structure having preferred orientation depending on the substrate temperature. The ZnO films deposited below 400 ¡ãC had a preferred (100) orientation while those deposited above 400 ¡ãC mostly had a preferred (002) orientation. The resistivity values of ZnO films depended on the types of carrier gas. The ZnO thin films deposited under N2 atmosphere in the range of 370-410 ¡ãC showed dense surface morphologies and resistivity values of 0.6-1.1 ¦¸-cm, a few orders of magnitude lower than those deposited under compressed air. Hydrogen substition in ZnO possibly contributed to decreasing resistivity in ZnO thin films deposited under N2 gas. The Hall measurements showed that the behavior of ZnO films deposited at 410 ¡ãC under the N2 atmosphere was n-type with a carrier density of 8.9-9.2¡Á1016 cm-3 and mobility of ¡«70 cm2/Vs. ZnO thin films showed transmission values at 550 nm wavelength in a range of 70-80 % . The values of band gaps extrapolated from the transmission results showed bandgap shrinkage in an order of milli electron volts in ZnO films deposited under N2 compared to those deposited under compressed air. The calculation showed that the bandgap reduction was possibly a result of carrier-carrier interactions.

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