Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence
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- 作者：Seung-Jun Yu ; Yoshimichi Ohki ; Makoto Fujimaki ; Koichi Awazu ; Junji Tominaga ; Kimikazu Sasa ; Tetsuro Komatsubara
- 关键词：Ion implantation ; Polarization dependent loss ; Planar lightwave circuit ; Birefringence
- 刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- 出版年：2008
- 出版时间：November 2008
- 年：2008
- 卷：266
- 期：21
- 页码：4762-4765
- 全文大小：406 K
文摘
Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7 dB was obtained, indicating that the method is effective for reducing polarization dependent loss.