Chemical bonding states and local structures of the oriented hexagonal BCN films synthesized by microwave plasma CVD

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• 作者：Md. Abdul Mannan ; Hideyuki Noguchi ; Tetsuya Kida ; Masamitsu Nagano ; Norie Hirao ; Yuji Baba
• 关键词：Microwave plasma CVD ; h-BCN ; Near-edge X-ray absorption fine structure ; Synchrotron radiation
• 刊名：Materials Science in Semiconductor Processing
• 出版年：2008
• 出版时间：June 2008
• 年：2008
• 卷：11
• 期：3
• 页码：100-105
• 全文大小：631 K

文摘

In order to synthesize oriented hexagonal boron carbonitride (h-BCN) films, borane-triethylamine complex (C₆H₁₈BN) was used as a single-source precursor. The films were deposited on Si (1 0 0) substrate by microwave plasma-enhanced chemical-vapor deposition using CH₄+H₂ as the carrier gas. The deposition was performed at different microwave powers of 200–500 W at working pressure of 5.0 Torr. The microhardness, estimated by nano-indentation test, of the films was found to be around 4 GPa. Fourier transform infrared spectroscopy (FT-IR) confirmed the formation of hexagonal BCN phase in a short-range order. The chemical composition and the local structures of films were studied by X-ray photoelectron spectroscopy (XPS) and the near-edge X-ray absorption fine structure (NEXAFS) spectroscopic measurements. XPS revealed that B, C and N atoms in the deposited films are in various chemical environments such as B–N, B–C, C–N and B–C–N atomic hybrid configuration. The NEXAFS measurement suggested that the B atoms are bonded not only to the N atoms but also to the C atoms to form various local structures of sp² B–C–N hybrid configurations. The polarization dependence of NEXAFS suggested that the local structures of the sp² BCN layers have different atomic orientations to the substrate.