Flash annealing influence on structural and electrical properties of TiO₂/TiO/Ti periodic multilayers

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• 作者：Arnaud Cacucci ; Olivier Heintz ; Ioannis Tsiaoussis ; Ludovic Avril ; Val茅rie Potin ; Luc Imhoff ; Nicolas Martin
• 关键词：Multilayers ; Titanium oxides ; Flash annealing ; HRTEM ; Periodic structure ; Electrical properties
• 刊名：Thin Solid Films
• 出版年：28 February, 2014
• 年：2014
• 卷：553
• 期：Complete
• 页码：47-51
• 全文大小：742 K

文摘

Multilayered structures with a 40 nm period composed of titanium and two different titanium oxides, TiO and TiO₂, were accurately produced by DC magnetron sputtering using the reactive gas pulsing process. These multilayers were sputtered onto Al₂O₃ sapphire to avoid substrate compound diffusion during flash annealing (ranging from 350 掳C to 550 掳C). Structure and composition of these periodic TiO₂/TiO/Ti stacks were investigated by X-ray diffraction, X-ray photoemission spectroscopy and transmission electronic microscopy techniques. Two crystalline phases 伪-Ti and fcc-TiO were identified in the metallic-rich sub-layers whereas the oxygen-rich ones were composed of a mixture of amorphous and rutile TiO₂ phase. DC electrical resistivity 蟻 measured for temperatures ranging from 25 to 200 掳C was influenced by the thermal treatments. The temperature coefficients of resistance of these periodic TiO₂/TiO/Ti multilayers were modified from 11.7 脳 10^鈭?#xA0;04 to 鈭?#xA0;8.81 脳 10^鈭?#xA0;04 K^鈭?#xA0;1. Local changes of crystallinity were reported and the resistivity responses of these annealed films could be linked to the typical electrical behavior of a metal-oxide mixture.