P-I-N amorphous silicon for thin-film light-addressable potentiometric sensors
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文摘

P-I-N stacked a-Si layers structure on glass is firstly applied in LAPS.

Photovoltage of P-I-N a-Si LAPS is much higher than conventional a-Si LAPS.

pH sensitivity is 40 mV/pH for NbOx layer on P-I-N a-Si LAPS.

Signal-to-noise ratio can be improved in high ac frequency modulation of red laser illumination by P-I-N a-Si LAPS, which is benefit for high-speed chemical image.

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