The scanning microbeam PIXE analysis facility at NIRS
详细信息 查看全文
- 作者：Imaseki ; Hitoshi ; Yukawa ; Masae ; Watt ; Frank ; Ishikawa ; Takahiro ; Iso ; Hiroyuki ; Hamano ; Tsuyoshi ; et. al.
- 关键词：PIXE ; Particle ; Microbeam ; Mapping ; Elemental distribution
- 刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- 出版年：2003
- 出版时间：September, 2003
- 年：2003
- 卷：210
- 期：Complete
- 页码：42-47
- 全文大小：409 K
文摘
In March 1999, a HVEE Tandetron was installed in the Electrostatic Accelerator Building of National Institute of Radiological Sciences (NIRS) for particle induced X-ray emission (PIXE) analysis. The specifications of the Tandetron accelerator system operating at NIRS are as follows: the accelerating voltage is 0.4–1.7 MV, and the maximum beam current is 500 nA at 3.4 MeV. The accelerator facility incorporates three beam lines for conventional, in-air and microbeam PIXE analysis.