Thin films of Ni1−xCrxFe2O4 are grown on Si(111) and Si(100) substrates.
Films on Si(111) substrate are better crystalline than those on Si(100).
XRD and FTIR results confirm the single phase growth of the films.
Cationic distribution deviates from inverse spinel structure, as revealed by XPS.
Saturation magnetization is larger on Si(100) but lower than the bulk value.