Xenon plasma as a potential source for EUV and soft X-ray radiations: Numerical experiments

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• 作者：M. Akel ; S. Alsheikh Salo ; S. Saboohi ; C.S. Wong
• 关键词：Xenon plasma ; Soft X-ray ; EUV emission ; FLYCHK code ; X-rays ratio method
• 刊名：Vacuum
• 出版年：March, 2014
• 年：2014
• 卷：101
• 期：Complete
• 页码：360-366
• 全文大小：966 K

文摘

The expected emission spectra of xenon plasma have been studied for different conditions using FLYCHK code. Expected xenon plasma spectra at certain electron temperature range have been plotted. The suitable electron temperature ranges for xenon plasma soft X-ray emission and extreme ultraviolet emission have been investigated. The X-ray ratio curves for various electron temperatures with probable electron and ion densities of the xenon plasma produced have been computed with the assumption of the non-local thermodynamic equilibrium model for the distribution of the ionic species. These ratio curves could be used for electron temperatures deduction of xenon plasma. Numerical experiments have been conducted on UNU/ICTP PF plasma focus device with Xe filling gas using Lee model. It shows and confirms the possibility of developing a UNU/ICTP PF plasma focus as a powerful EUV and X-ray radiation source simply by selecting the working gas pressure, choosing corresponding design and operating parameters of the device. We have illustrated that the results obtained from FLYCHK simulation can be used to provide spectroscopic information of the plasma focus simulated by using Lee model.