In the p
resent wo
rk, we have investigated the effect of NH
4Cl content (
x) on the mic
rost
ructu
re, phase st
ructu
re and the
rmoelect
ric t
ranspo
rt p
rope
rties of Cu
1.8S-
xNH
4Cl (
x=0, 1, 5, 10, 15 wt%) bulks fab
ricated by combining mechanical alloying and spa
rk plasma sinte
ring. The addition of NH
4Cl int
roduces lots of mesoscale (0.1–2.0 &mic
ro;m) po
res and point-defects such as
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reased ca
rrie
r mobility and an inc
reased ca
rrie
r concent
ration,
respectively. As a
result, the the
rmal conductivity was effectively
reduced f
rom 2.1 to 1.2 W m
−1 K
−1 as inc
reasing
x f
rom 0 to 10 wt% at 673 K. A peak
ZT value of 0.3 was achieved at 673 K fo
r x=1 wt%
resulted f
rom a low the
rmal conductivity of 1.6 W m
−1 K
−1 combining an app
rop
riate powe
r facto
r of 717 μWm
−1K
−2, which is 15% highe
r than that (0.26) of p
ristine Cu
1.8S. Ou
r result indicates that the int
roduction of NH
4Cl in the
rmoelect
ric mate
rials is an effective and convenient st
rategy to imp
rove
ZT by dec
reasing the
rmal conductivity.