Enhanced performance for solar cells with moth-eye structure fabricated by UV nanoimprint lithography

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• 作者：Fang Jiao ^{jiaofang2005@126.com} ; Qiyu Huang ; ^{qiyu@sjtu.edu.cn} ; Wangchun Ren ^{renwangchun@ic.sjtu.edu.cn} ; Wei Zhou ^{zhouwei@ic.sjtu.edu.cn} ; Fangyi Qi ^{qifangyi@ic.sjtu.edu.cn} ; Yizhou Zheng ^{zhengyizhou@ic.sjtu.edu.cn} ; Jing Xie ^{xiejing@ic.sjtu.edu.cn}
• 关键词：Moth-eye structure ; UV nanoimprinting lithography ; AAO mask ; Solar cells
• 刊名：Microelectronic Engineering
• 出版年：2013
• 出版时间：March, 2013
• 年：2013
• 卷：103
• 期：Complete
• 页码：126-130
• 全文大小：751 K

文摘

Moth-eye structures were fabricated on monocrystalline silicon and monocrystalline silicon P-N junction solar cell surface respectively, using anodized aluminum oxide (AAO) membrane as a mask by means of UV nanoimprint lithography. A nano-scale pattern of porous alumina membrane mask was transferred to the UV-curable precursor with high fidelity by a fabrication process conducted at room temperature and normal atmosphere. The antireflection film reduced the surface reflection to about 4 % in the wavelength of 425-1200 nm for silicon and improved the conversion efficiency by 19 % for solar cells. The moderate fabrication condition made the method suitable for applications in different kinds of solar cells.