Simultaneous reduction and N-doping of graphene oxides by low-energy N₂⁺ ion sputtering

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• 作者：Liang Zhang ; Yifan Ye ; Dingling Cheng ; Wenhua Zhang ; Haibin Pan ; Junfa Zhu
• 刊名：Carbon
• 出版年：2013
• 出版时间：October, 2013
• 年：2013
• 卷：62
• 期：Complete
• 页码：365-373
• 全文大小：1746 K

文摘

An easy and catalyst-free method was used to obtain N-doped reduced graphene oxides (N-RGO) through low-energy N₂⁺ ion sputtering of graphene oxides (GO). The simultaneous reduction and N-doping of GO during the sputtering were systematically investigated by X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure and Raman spectroscopy. The N-doping and reduction levels, which are determined by the N/C and O/C atomic ratios from the quantitative XPS analysis, respectively, can be easily controlled by varying the N₂⁺ ion sputtering time. In addition, three different N species, namely, nitrile-like N, graphitic N and pyridinic N, can be distinguished in N-RGO.