This study presents the novel development of low cost and high efficiency blue laser direct-writing equipment.
The fabrication of periodic and aperiodic nanostructure patterns via mask-less laser lithography.
The 3-DOF laser interferometer measurement system is used to feedback the displacement (X, Y, θz) of the equipment to the control system.
The equipment is capable of fabricating various large area periodic nanostructure patterns, aperiodic nanostructure patterns, and two-dimensional patterns.
The equipment positioning accuracy is 50 nm at speed 50 mm/s and has a minimum critical dimension about 100 nm.