Structural and electrical properties of indium oxide thin films grown by pulsed laser deposition in oxygen ambient

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• 作者：Jolanta Stankiewicz^a ; ^{jolanta@unizar.es} ; Xavier Torrelles^b ; José ; Luis Garc&iacute ; a-Muñ ; oz^b ; Javier Blasco^a
• 关键词：Indium oxide ; Thin film ; Electrical properties
• 刊名：Journal of Alloys and Compounds
• 出版年：2017
• 出版时间：15 February 2017
• 年：2017
• 卷：694
• 期：Complete
• 页码：1280-1286
• 全文大小：1980 K
• 卷排序：694

文摘

In2O3 thin films were grown by PLD varying O2 pressure on different substrates. Morphology of these films varies strongly with O2 pressure, irrespective of substrate. A systematic increase in resistivity is observed as O2 pressure varies from 0 to 1 mbar.