Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography

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• 作者：Na Yao ; Changtao Wang ^{changtao_w@yahoo.com.cn} ; Guowei Ren ; Zeyu Zhao ; Qin Feng ; Xiangang Luo ; ^{lxg@ioe.ac.cn}
• 关键词：Super resolution ; Photolithography ; Surface plasmon
• 刊名：Superlattices and Microstructures
• 出版年：2012
• 出版时间：July, 2012
• 年：2012
• 卷：52
• 期：1
• 页码：63-69
• 全文大小：846 K

文摘

A truncated hyperlens composed of pairs of metal-dielectric cylindrical multilayers is proposed to demagnify the diffraction limited spot to achieve deep subwavelength imaging. The diffraction limited spot is focused by far field converging cylindrical wave. Numerical simulations demonstrate that full width at half maximum (FWHM) of the image down to 32 nm (?em>¦Ë/11) can be achieved from object (?em>¦Ë/3) by 365 nm light illumination. It is discussed that the influence of size and focusing shift of the spot on those of the demagnification image on photoresist. It is also demonstrated that multi-objects can be demagnified and projected on the photoresist.