Effects of substrate bias voltage on mechanical properties and tribological behaviors of RF sputtered multilayer TiN/CrAlN films
详细信息 查看全文
- 作者：Xiao Chen ; Yeting Xi ; Jie Meng ; Xiaolu Pang ; Huisheng Yang ; hsyang@263.net" class="auth_mail" title="E-mail the corresponding author
- 关键词：TiN/CrAlN films ; RF magnetron sputtering ; Substrate bias ; Mechanical properties ; Tribological properties
- 刊名：Journal of Alloys and Compounds
- 出版年：2016
- 出版时间：25 April 2016
- 年：2016
- 卷：665
- 期：Complete
- 页码：210-217
- 全文大小：3783 K
文摘
- •
The correlation between deposition rate and substrate bias is studied.
- •
The mechanical properties are systematically analyzed as a function of substrate bias.
- •
The tribological behavior is strongly influenced by substrate bias voltage.
- •
Multilayer TiN/CrAlN films exhibit optimal comprehensive properties at a substrate bias of −100 V.