Investigation of shear-banding mechanism in fully dense nanocrystalline Ni sheet

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• 作者：Rongtao Zhu ; Jianqiu Zhou ; Xinbo Li ; Hua Jiang ; Xiang Ling
• 关键词：Nanocrystalline Ni ; Shear-banding mechanism ; Digital image correlation ; In-situ TEM testing ; Fracture surface
• 刊名：Materials Characterization
• 出版年：2010
• 出版时间：April 2010
• 年：2010
• 卷：61
• 期：4
• 页码：396-401
• 全文大小：482 K

文摘

Evolution of shear banding in fully dense electrodeposited nanocrystalline Ni was successfully monitored by using a digital image correlation technique under a quasi-static uniaxial tensile load. To investigate the microscopic physical mechanism of the shear banding, in-situ tensile testing for the nanocrystalline Ni sample was conducted in a transmission electron microscope and fracture surface of the sample was examined by field emission scanning electron microscope. The results suggest that grain boundary migration based on atomic diffusion is a main carrier of the shear banding.