Investigations of Ar ion irradiation effects on nanocrystalline SiC thin films
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文摘

Thin polycrystalline SiC films grown by the pulsed laser deposition technique were irradiated by 800 keV Ar ions at a dose of 2.6 × 1014 at/cm2.

The SiC films hardness and Young modulus values significantly decreased after irradiation.

Glancing X-ray diffraction investigations showed a partial transformation of the SiC hexagonal phase into the cubic phase.

Smooth PLD grown thin films are excellent for radiation effects investigations using XRR, GIXRD and nanoindentation techniques.

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