A study of intrinsic amorphous silicon thin film deposited on flexible polymer substrates by magnetron sputtering
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文摘

Amorphous silicon thin films were deposited on PET substrate.

Experimental parameters were systematically investigated.

Deposition rate on PET increased remarkably with sputtering power.

Different processing parameters affect the deposition rate of amorphous silicon significantly.

Absorption coefficient of thin films reduced with wavelength.

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