Effects of rf power on chemical composition and surface roughness of glow discharge polymer films
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- 作者：Ling Zhang ; Xiaoshan He ; Guo Chen ; Tao Wang ; Yongjian Tang ; Zhibing He ; hezhibing802@163.com" class="auth_mail" title="E-mail the corresponding author
- 关键词：Glow discharge polymer films ; Chemical composition ; Surface morphology ; Surface roughness
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：15 March 2016
- 年：2016
- 卷：366
- 期：Complete
- 页码：499-505
- 全文大小：2193 K
文摘
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The growth mechanism of defects in GDP films was studied upon plasma diagnosis.
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Increasing rf power enhanced the etching effects of smaller-mass species.
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The “void” defect was caused by high energy hydrocarbons bombardment on the surface.
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The surface roughness was only 12.76 nm, and no “void” defect was observed at 30 W.