Synthesis and characterization of hysteresis-free zirconium oligosiloxane hybrid materials for organic thin film transistors
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文摘
A robust, solution processed zirconium oligosiloxane gate dielectric is demonstrated. It shows long-term stability, high dielectric strength and low leakage current. High electrical performance OTFTs and nearly hysteresis-free have been obtained. The gate dielectric is suitable for fabricating reliable electronic devices.

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