Optimization of thin-film design for multi-layer dielectric grating

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• 作者：Shijie Liu ; Jianyong Ma ; Zicai Shen ; Yunxia Jin ; Ji ; a Shao ; Zhengxiu Fan
• 关键词：Multi-layer dielectric grating ; Thin film ; Diffraction efficiency and laser damage
• 刊名：Applied Surface Science
• 出版年：2007
• 出版时间：30 January 2007
• 年：2007
• 卷：253
• 期：7
• 页码：3642-3648
• 全文大小：1437 K

文摘

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)⁹H design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al₂O₃ between the initial design and an optimized HfO₂ top layer. The optimized MLD coatings exhibits a low reflectance of 0.017 % under photoresist at the exposure angle of 17.8° for 413 nm light and a high reflectance of 99.61 % under air at the use angle of 51.2° for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5 % and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation.