Preparation of W-Cu functionally graded material coated with CVD-W for plasma-facing components

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• 作者：Jiupeng Song ; Yang Yu ; Zhigang Zhuang ; Youyun Lian ; Xiang Liu ; Yang Qi
• 刊名：Journal of Nuclear Materials
• 出版年：2013
• 出版时间：November, 2013
• 年：2013
• 卷：442
• 期：1-3_supp_S1
• 页码：S208-S213
• 全文大小：2064 K

文摘

W-Cu functionally graded materials (FGMs) are designed to be a transition layer between CuCrZr bulk material and a W surface layer in plasma-facing components. In this study, a type of in-house developed ultrafine W-Cu composite powder has been used to fabricate a W-Cu FGM, which consists of three layers of W-10Cu, W-32Cu, and W-60Cu respectively. The sintered FGM has a homogeneous microstructure and a residual porosity of less than 3.3 % . The W-10Cu side of the FGM has been coated with pure W using an optimized chemical vapor deposition (CVD) process with an increased deposition rate of 0.8 mm/h. The thickness of the coating is around 2 mm and the density is as high as 19.23 g/cm³. The columnar grain size of CVD-W at the end of deposition is approximately 20-50 ¦Ìm in the direction parallel to the substrate and 1-1.5 mm in the direction perpendicular to the substrate. Compared with plasma-sprayed W-Cu FGM and W coating, the FGM and CVD-W developed in this study have a better microstructure, which is important for the thermal and physical properties of the components.