Investigations on the effect of substrate temperature on the properties of reactively sputtered zirconium carbide thin films

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• 作者：S. Sathish Kumar^a ; Amit Sharma^b ; G. Mohan Rao^a ; ^{gmrao@isu.iisc.ernet.in} ; Satyam Suwas^b
• 关键词：Zirconium carbide (ZrC) ; Magnetron sputtering ; Substrate temperature ; Microstructure ; Morphology ; Chemical bonding ; Grain size ; Nanoindentation
• 刊名：Journal of Alloys and Compounds
• 出版年：2017
• 出版时间：25 February 2017
• 年：2017
• 卷：695
• 期：Complete
• 页码：1020-1028
• 全文大小：2594 K
• 卷排序：695

文摘

ZrC thin films have been grown by reactive magnetron sputtering using CH4/Ar. Peak broadening at growth temperature of 325 °C was observed. Mechanism responsible for increase in FWHM and corresponding effect on mechanical property was investigated. Crystallographic texture also strengthened with increase in substrate temperature. Nanoindentation showed enhanced hardness typically at 325 °C due to hall petch effect.