Comparison of HF and HCl cross-contamination between different ENTEGRIS FOUP platforms and Cu-coated wafers

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• 作者：Fernando Herr&aacute ; n^a ; ^{fernando.herran@cea.fr} ; Paola Gonz&aacute ; lez-Aguirre^a ; ^b ; Carlos Beitia^a ; Jim Ohlsen^b ; Jorgen Lundgren^b ; Hervé ; Fontaine^a
• 关键词：AMC ; Volatile acids ; Affinity ; Polymers ; Solubility ; Diffusivity
• 刊名：Microelectronic Engineering
• 出版年：2017
• 出版时间：5 February 2017
• 年：2017
• 卷：169
• 期：Complete
• 页码：34-38
• 全文大小：630 K
• 卷排序：169

文摘

The faster HF uptake evidences a higher permeation rate (affinity) regarding HCl. The higher HF-polymer solubility implies lower HF outgassing concentrations. The larger FOUP to wafer HF transfer results from a higher HF-polymer diffusivity. The best FOUP in this study must minimize HX transfer to wafers: EBM/CNT. Wafer exposure is recommended for FOUP evaluation: outgassing might be misleading.