Controlled modification of octadecyltrichlorosilane self-assembled monolayer by CO₂ plasma

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• 作者：Nicolas Delorme ; Jean-Franç ; ois Bardeau ; Alain Bulou and Fabienne Poncin-Epaillard
• 关键词：Plasma processing ; Octadecyltrichlorosilane ; Atomic force microscopy ; X-ray photoelectron spectroscopy
• 刊名：Thin Solid Films
• 出版年：2006
• 出版时间：21 February 2006
• 年：2006
• 卷：496
• 期：2
• 页码：612-618
• 全文大小：204 K

文摘

CO₂-plasma is used to introduce functional groups on the uppermost surface of an alkoxysilane self-assembled monolayer (SAM). The structural and chemical modifications of the material surface were monitored by X-ray reflectometry, atomic force microscopy, X-ray photoelectrons spectroscopy and water contact angle measurements. Optimization of the plasma parameters is performed in order to achieve a maximum functionalization and to prevent degradation of the SAM. Finally, the ability of grafting organic compounds onto the plasma modified SAMS was demonstrated by the formation of an alkoxysilane bilayer.