The improvement of high power impulse magnetron sputtering performance by an external unbalanced magnetic field
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- 作者：Chunwei Lia ; b ; lcwnefu@126.com" class="auth_mail" title="E-mail the corresponding author ; Xiubo Tianb ; xiubotian@163.com" class="auth_mail" title="E-mail the corresponding author ; Chunzhi Gongb ; Jianping Xuc
- 关键词：High power impulse magnetron sputtering ; External magnetic field ; Target discharge current ; Substrate ion current ; Optical emission spectroscopy
- 刊名：Vacuum
- 出版年：2016
- 出版时间：November 2016
- 年：2016
- 卷：133
- 期：Complete
- 页码：98-104
- 全文大小：1337 K
文摘
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The confinement of electrons by the external magnetic field is enhanced, increasing the substrate ion current.
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With the coil current increasing, the ionization rate of Ar and V increase.
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A high plasma density HIPIMS technique had been formed when the external magnetic field was applied.