Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layers

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• 作者：G. Greczynski^a ; ^{grzgr@ifm.liu.se} ; D. Primetzhofer^b ; J. Lu^a ; L. Hultman^a
• 关键词：TiN ; XPS ; Magnetron sputtering ; Binding energy ; VN ; CrN ; NbN ; ZrN ; MoN ; HfN ; TaN ; WN ; AlN ; SiN
• 刊名：Applied Surface Science
• 出版年：2017
• 出版时间：28 February 2017
• 年：2017
• 卷：396
• 期：Complete
• 页码：347-358
• 全文大小：2459 K
• 卷排序：396

文摘

First non-destructive measurements of XPS core level binding energies for group IVb-VIb transition metal nitrides are presented. All films are grown under the same conditions and analyzed in the same instrument, providing a useful reference for future XPS studies. Extracted core level BE values are more reliable than those obtained from sputter-cleaned N-deficient surfaces. Comparison to Ar+-etched surfaces reveals that even mild etching conditions result in the formation of a nitrogen-deficient surface layer. The N/metal concentration ratios from capped samples are found to be 25-90% higher than those from the corresponding ion-etched surfaces.