Modify the Schottky contact between fluorine-doped tin oxide front electrode and p-a-SiC:H by carbon dioxide plasma treatment
详细信息    查看全文
文摘

CO2 plasma treatment is a simple and effective way to modify the interface of p-a-SiC:H/FTO.

The behavior of the radicals in COP and the mechanism of the COP treatment on FTO was proposed.

Both of the Voc and FF of the a-Si:H solar cells have been improved based on the COP treatment.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700