Thirty K3 files, size #40, 0.02 taper and 25-mm length, were allocated into 2 groups as follows: group A, 15 files exposed to nitrogen ion implantation at a dose of 2.5 × 1017 ions/cm2, voltage 200 KeV, current density 1 μA/cm2, temperature 130°C, and vacuum conditions of 10 × 10−6 mm Hg for 6 hours; and group B, 15 nonimplanted files. One extra file was used for process control. All instruments were subjected to bend testing on a modified troptometer, with measurement of the load required for flexure to an angle of 30°. The Mann-Whitney U test was used for statistical analysis. Findings with P <.05 were considered significant.
The mean load required to bend instruments at a 30° angle was 376.26 g for implanted instruments and 383.78 g for nonimplanted instruments. The difference was not statistically significant.
Our findings show that nitrogen ion implantation has no appreciable effect on the flexibility of NiTi instruments.