The mechanism of growth of ZnO nanorods by reactive sputtering

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• 作者：R. Nandi ; S.S. Major ; ^{syed@iitb.ac.in}
• 关键词：ZnO ; Nanorods ; Reactive sputtering ; Morphology ; Growth mechanism
• 刊名：Applied Surface Science
• 出版年：2017
• 出版时间：31 March 2017
• 年：2017
• 卷：399
• 期：Complete
• 页码：305-312
• 全文大小：3705 K
• 卷排序：399

文摘

ZnO nanorods were grown by DC reactive magnetron sputtering of zinc target. Substrate temperature critically controls the morphology of ZnO films/nanorods. Vertically aligned and separated nanorods grow only in the range of 700–750 °C. Substantial decrease in surface diffusion length is responsible for nanorod growth. Increase in diameter with deposition flux is attributed to enhanced surface diffusion.