Improvement of high-temperature resistance of the Ag-based multilayer films deposited by magnetron sputtering

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• 作者：Jingkai Yang ; Hongli Zhao ; Hesong Sha ; Jian Li ; Liping Zhao ; Jiajia Chen ; Bin Yu ; Fucheng Zhang
• 关键词：Thin films ; Ag-based ; X-ray diffraction ; Electrical properties ; Optical properties
• 刊名：Materials Letters
• 出版年：1 March, 2014
• 年：2014
• 卷：118
• 期：Complete
• 页码：62-65
• 全文大小：447 K

文摘

Ag-based films with the multilayer construction of top-Si₃N₄/SnO₂/NiCrO_x/Ag/ZnO/NiCrO_x/TiO₂/under-Si₃N₄ were deposited on glass substrates by magnetron sputtering at room temperature, and then heated at 200 掳C, 400 掳C, 600 掳C, 650 掳C and 700 掳C for 5 min in the air. The effects of post-heated temperature on the optical and electrical properties of the advanced Ag-based Low-E glass were investigated. The results show that the multilayer films mainly contain a crystalline Ag layer with 3C structure and other amorphous layers. A transformation of the preferred orientation from (111) plane to (220) plane occurs at the temperature of 600 掳C. The optimal overall performance of Ag-based Low-E films is obtained when heated at 600 掳C for 5 min with the minimum sheet resistance of 5.10 惟/鈻?and a lowest emissivity of 0.06 and the transmittance in the visible region of 79.40%. The high-temperature resistance of Ag-based films has been improved with this modified kind of multilayer construction.