Hydrogen insertion in titanium carbide based thin films (nc-TiCx/a-C:H) - comparison with bulk TiCx
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- 作者：Julien Nguyen ; Cé ; dric Jaoul ; jaoul@ensil.unilim.fr" class="auth_mail" title="E-mail the corresponding author ; Nicolas Glandut ; Pierre Lefort
- 关键词：Reactive sputtering ; Hybrid PVD-PECVD process ; Titanium carbide thin films ; Amorphous carbon ; Nanocomposite ; Electrochemical hydrogen insertion
- 刊名：Thin Solid Films
- 出版年：2016
- 出版时间：1 August 2016
- 年：2016
- 卷：612
- 期：Complete
- 页码：172-178
- 全文大小：716 K
文摘
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nc-TiCx/a-C:H thin films are prepared hybrid Magnetron Sputtering - PECVD process.
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Different carbon contents are obtained by changing the hydrocarbon flowrate.
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Expanded lattice parameter of the TiCx phase and a-C:H phase are observed.
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Electrochemical hydrogen insertion strongly depends on the carbon content.
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The maximum insertion is 22 times more important than bulk TiCx.