Successful entrapment of carbon dots within flexible free-standing transparent mesoporous organic-inorganic silica hybrid films for photonic applications
Highly luminescent carbon dots embedded in flexible organic-silica mesoporous films. Protection of carbon dots from high temperature up to 500 °C. Effortless and pressure-less holographic mask replication with 2% shrinkage. Free standing flexible films can be formed without the use of substrates. Mesoporous final composite material is ideal for soft lithography.