Effect of thermal annealing on the optical properties of CdGeAs2 wafers
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文摘
A crack-free CdGeAs2 single crystal 15 mm in diameter and 50 mm in length was grown in a three-zone tubular furnace by the modified vertical Bridgman method. During the annealing processes, the effects of treatments with different atmosphere, different temperatures and time were investigated. The as-grown and annealed wafers were characterized using X-ray diffractometer (XRD), energy dispersive spectroscopy (EDS), Fourier transform infrared spectroscopy (FTIR) and IR microscope. Conclusively, the results confirm annealing could improve the optical qualities of as-grown CdGeAs2 crystal. The best result was obtained under cover-up with CdGeAs2 polycrystalline powder at 450 ¡ãC for 150 h and the IR transmittance of the wafer measured by FTIR was up to 48.65 % nearby 5.5 ¦Ìm and exceeded 50 % in the range of 8-12 ¦Ìm. Additionally, the monolithic homogeneity of the crystal has also been greatly improved after annealing under cover-up with polycrystalline powder.

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