Single-mode-resonance interference in photoresist sub-micron waveguide for high exposure depth nanolithography
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- 作者：Zheng Yanga ; b ; cqyangking@cigit.ac.cn" class="auth_mail" title="E-mail the corresponding author ; Zhiyou Zhangc ; Peng Wua ; b ; Liangping Xiaa ; b ; Shaoyun Yina ; b ; Jinglei Duc
- 关键词：Lithography ; Subwavelength ; Nanostructure fabrication ; Waveguide ; Single-mode-resonance
- 刊名：Microelectronic Engineering
- 出版年：2016
- 出版时间：25 March 2016
- 年：2016
- 卷：154
- 期：Complete
- 页码：8-11
- 全文大小：700 K
文摘
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The single-mode-resonance interference lithography (SMRIL) is proposed.
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The working principle for SMRIL is presented.
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FDTD simulations demonstrate that the SMRIL can realize lithography with critical dimension smaller than λ/6 and exposure depth larger than 2λ.