Temperature regulated-chemical vapor deposition for incorporating NiO nanoparticles into mesoporous media
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- 作者：Sang Wook Hana ; Il Hee Kima ; Dae Han Kima ; Ki Jung Parka ; Eun Ji Parka ; Myung-Geun Jeonga ; Young Dok Kima ; b ; ydkim91@skku.edu" class="auth_mail" title="E-mail the corresponding author
- 关键词：Temperature regulated-chemical vapor deposition (TR-CVD) ; NiO ; Mesoporous Al2O3 ; CO oxidation
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：1 November 2016
- 年：2016
- 卷：385
- 期：Complete
- 页码：597-604
- 全文大小：3023 K
文摘
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Ni nanoparticles were deposited on mesoporous Al2O3 using TR-CVD method.
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The CO oxidation experiments were conducted over the NiO/Al2O3 sample.
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Annealing process at 450 °C could successfully regenerate the deactivated NiO/Al2O3 catalysts.
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TR-CVD is a new strategy that can relatively simply incorporate nanoparticles into the mesoporous substrate.