Evolution effects of the copper surface morphology on the nucleation density and growth of graphene domains at different growth pressures

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• 作者：Seyed Mahdi Hedayat^a ; Javad Karimi-Sabet^b ; ^{j_karimi@alum.sharif.edu} ; Mojtaba Shariaty-Niassar^a ; ^{mshariat@ut.ac.ir}
• 关键词：Cu surface morphology ; Electropolishing ; Graphene CVD growth ; Nucleation density ; Surface evolution ; Growth pressure
• 刊名：Applied Surface Science
• 出版年：2017
• 出版时间：31 March 2017
• 年：2017
• 卷：399
• 期：Complete
• 页码：542-550
• 全文大小：2609 K
• 卷排序：399

文摘

Manipulation of the Cu surface morphology in a wide range by electropolishing treatment. Comparison of the nucleation density of graphene at low pressure and atmospheric pressure CVD processes. Controlling the evolution of the Cu surface morphology inside a novel confined space. Growth of large-size graphene domains.