Low-cost fabrication of nanoimprint templates with tunable feature sizes at a constant pitch

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• 作者：Shuhao Si ; ^{shuhao.si@tu-ilmenau.de} ; Lars Dittrich ; Martin Hoffmann
• 关键词：Soft UV nanoimprint lithography ; NIL ; Nanofabrication ; Template ; Cryogenic dry etching ; Tunable feature sizes ; Low cost ; RIE ; ICP
• 刊名：Microelectronic Engineering
• 出版年：2017
• 出版时间：25 February 2017
• 年：2017
• 卷：170
• 期：Complete
• 页码：34-38
• 全文大小：887 K
• 卷排序：170

文摘

A two-step fabrication chain is designed to replicate a NIL master to multiple NIL templates at very low-cost and in short processing cycle. The feature size of the new NIL template can be shrinked and controllably tuned whereas the pitch is maintained constant. ICP Cryo silicon etch is utilized to finalize the products with smooth and vertical sidewalls for NIL templates. The methodology can be used to tune the feature sizes of nano-pillars, cavities, cone, pyramids, lines, wires, etc.