Functional epoxy polymer for direct nano-imprinting of micro-optical elements

详细信息    查看全文

• 作者：R. Fader ; J. L ; wehr ; M. Rumler ; M. Rommel ; A.J. Bauer ; L. Frey ; R. V?lkel ; M. Brehm ; A. Kraft
• 关键词：SCIL ; UV polymers ; Soft imprint lithography ; TiO2 nanoparticles ; Refractive index matching
• 刊名：Microelectronic Engineering
• 出版年：2013
• 出版时间：October, 2013
• 年：2013
• 卷：110
• 期：Complete
• 页码：90-93
• 全文大小：1882 K

文摘

This work presents a functional resist for the direct fabrication of micro-optical elements with UV-enhanced substrate conformal imprint lithography (UV-SCIL). This functional resist is based on a UV-curable epoxy polymer where TiO₂ nanoparticles are enclosed. Adding these particles to the polymer raises the refractive index of the functional resist with raising particle content from 1.52 up to 1.64 at a wavelength of 633 nm. Therefore, the refractive index can be matched for many micro-optical applications. Here, multilevel Fresnel lenses from a 200 mm silica substrate are transferred into the functional resist by UV-SCIL with nanometer resolution and high structure fidelity.