Initial catalyzation analysis of electroless NiP nanoimprinting mold replicated from self-assembled monolayer modified nanopatterns
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- 作者：Cheng Ping Lin ; Mikiko Saito ; Takayuki Homma
- 关键词：Nanoimprint mold ; Hardness ; Adhesion ; Self-assembled monolayer ; Electroless deposition
- 刊名：Electrochimica Acta
- 出版年：2012
- 出版时间：1 November, 2012
- 年：2012
- 卷：82
- 期：Complete
- 页码：75-81
- 全文大小：1750 K
文摘
A nanoimprint lithography mold was fabricated through electroless deposition combined with self-assembled monolayer (SAM) modification. To copy nanopatterns as ¡°replicates¡±, NiP was electrolessly deposited on a nanopatterned master mold (made of SiO2/Si), whose surface was modified with 3-[2-(2-aminoethylamino)ethylamino]propyltrimethoxysilane (TAS). NiP deposits were then manually detached from the mold. SAM improves Pd catalyst coverage for electroless deposition, further improving the morphology of the electroless deposition of NiP on the nanopatterned master mold and controlling the adhesion strength between electroless deposited NiP and the nanopatterned master mold to a level appropriate for smooth detachment. The initial catalyzation process and mechanical properties (such as, the hardness and adhesion strength of the SiO2 substrate) of electroless deposited NiP were also systematically investigated.