Band alignment of atomic layer deposited TiO₂/multilayer MoS₂ interface determined by x-ray photoelectron spectroscopy

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• 作者：Xinke Liu^a ; Le Chen^a ; ^{524212525@qq.com} ; Qiang Liu^b ; Jiazhu He^a ; Kuilong Li^a ; Wenjie Yu^b ; Jin-Ping Ao^a ; Kah-Wee Ang^c
• 关键词：Multilayer MoS2 ; TiO2 ; Band alignment ; X-ray photoelectron spectroscopy
• 刊名：Journal of Alloys and Compounds
• 出版年：2017
• 出版时间：25 March 2017
• 年：2017
• 卷：698
• 期：Complete
• 页码：141-146
• 全文大小：1584 K
• 卷排序：698

文摘

Band alignment of ALD-TiO2/ML-MoS2 was characterized using XPS. Effect of CHF3 plasma treatment on the band alignment of TiO2/ML-MoS2 was evaluated. ΔEV and ΔEC of ALD-TiO2/ML-MoS2 has been analyzed in details.