Increasing accuracy and precision of digital image correlation through pattern optimization

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• 作者：G.F. Bomarito^a ; ^{geoffrey.f.bomarito@nasa.gov} ; J.D. Hochhalter^a ; T.J. Ruggles^b ; A.H. Cannon^c ; ^d
• 关键词：Image correlation ; Pattern optimization ; Pattern quality metrics ; 2D full-field measurements
• 刊名：Optics and Lasers in Engineering
• 出版年：2017
• 出版时间：April 2017
• 年：2017
• 卷：91
• 期：Complete
• 页码：73-85
• 全文大小：2765 K
• 卷排序：91

文摘

The component of DIC accuracy due to an applied pattern is quantified and assessed. The relationship between several pattern quality metrics and accuracy is investigated. Optimized patterns are produced based on the pattern quality metrics. The optimized patterns are approximately 12% more accurate and precise than random patterns.