Influence of etch pit development on the surface area and dissolution kinetics of the orthoclase (001) surface

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• 作者：Marion Pollet-Villard^a ; ^{polletvillard@unistra.fr} ; Damien Daval^a ; ^b ; Bertrand Fritz^a ; Kevin G. Knauss^b ; Gerhard Sch&auml ; fer^a ; Philippe Ackerer^a
• 关键词：Reactive surface area ; Dissolution kinetics ; Etch pits ; Orthoclase (001) face ; Hydrothermal alteration
• 刊名：Chemical Geology
• 出版年：2016
• 出版时间：30 December 2016
• 年：2016
• 卷：447
• 期：Complete
• 页码：79-92
• 全文大小：4272 K
• 卷排序：447

文摘

Etch pits are responsible for an increase of 20% of the surface area. Despite etch pit formation, the total surface area reaches a steady state. Pit walls are more reactive than the (001) face. Defect parameters affect the dissolution rate by less than an order of magnitude.