刊名:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
出版年:1999
出版时间:January 3, 1999
年:1999
卷:149
期:1-2
页码:153-166
全文大小:285 K
文摘
A thin layer of ZnO0.3 deposited on a SiO2 glass substrate was irradiated with a 2 MeV α microbeam. The disappearance of ZnO0.3 in the neighbourhood of the beam was registered in situ. We quantitatively account for this behaviour in the framework of a very simple vaporisation model based both upon the local temperature increase resulting from the microbeam itself and upon the variation of the Zn vapour pressure with the local temperature. Other possible explanations are briefly discussed.