Effect of annealing on 尾-Ga₂O₃ film grown by pulsed laser deposition technique

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• 作者：Anshu Goyal ; Brajesh S. Yadav ; O.P. Thakur ; A.K. Kapoor ; R. Muralidharan
• 关键词：尾-Ga2O3 ; Annealing ; PLD (pulsed laser deposition technique) ; X-ray ; SIMS ; Band gap
• 刊名：Journal of Alloys and Compounds
• 出版年：15 January, 2014
• 年：2014
• 卷：583
• 期：Complete
• 页码：214-219
• 全文大小：1597 K

文摘

Oriented 尾-Ga₂O₃ films were grown on sapphire substrate (0 0 0 1) by pulsed laser deposition (PLD) technique. The crystalline structure and optical band gap were studied as a function of growth temperature, laser beam energy, annealing temperature and time. To tailor the band gap of 尾-Ga₂O₃ films by Al diffusion from the sapphire substrate the films were annealed for 24 h at different temperatures. The amount of Al diffusion was different for different temperatures of annealing which resulted in the increase of band gap as well as the shift of diffraction peaks to higher angles with increasing temperature. The diffusion of Al was also confirmed using secondary ion mass spectrometry (SIMS) depth profiling. The annealed films showed high transparency in the deep UV region of the spectrum.