Photoinduced cationic curing of epoxy monomers with photolabile o-NBE groups. Initiation proceeds by direct or sensitized photolysis of a photoacid generator. Thermal post-curing step is required for efficient curing of photolabile monomers. Controlled photocleavage of covalent links is evidenced by sol-gel analysis. Photocleavage enables preparation of positive tone patterns with good resolution.