MOCVD growth of CdO very thin films: Problems and ways of solution
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- 作者：Adelaida Huerta-Barberà ; a ; Adelaida.Huerta@uv.es" class="auth_mail" title="E-mail the corresponding author ; Lluí ; s Manel Guiaa ; Oleksii Klymova ; Vicente Marí ; n-Borrá ; sa ; Carmen Martí ; nez-Tomá ; sa ; Julen Tamayo-Arriolab ; Alejandro Kurtzb ; Miguel Montes Bajob ; Elias Muñ ; ozb ; Adrian Hierrob ; Vicente Muñ ; oz-Sanjosé ; a ; Vicente.Munoz@uv.es" class="auth_mail" title="E-mail the corresponding author
- 关键词：CdO ; MOCVD ; Thin films ; HRXRD ; SEM ; Optical and electrical properties
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：1 November 2016
- 年：2016
- 卷：385
- 期：Complete
- 页码：209-215
- 全文大小：1578 K
文摘
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Very thin flat films of CdO (001) on r-sapphire have been obtained.
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The lowest thickness is 5 times lower than other previously reported.
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The effect of the density of nucleation points has been analyzed.