NIR diode laser spectroscopy of HF and HCl at multiple points in the atmospheric pressure CVD of tin oxide films
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- 作者：Philip A. Martin ; Robert J. Holdsworth ; David W. Sheel ; Rutger Schlatmann
- 关键词：Tin oxide films ; Atmospheric pressure CVD ; In situ diagnostics ; Photovoltaics ; Diode laser spectroscopy
- 刊名：Surface and Coatings Technology
- 出版年：2007
- 出版时间：25 September 2007
- 年：2007
- 卷：201
- 期：22-23
- 页码：9030-9034
- 全文大小：516 K
文摘
This paper reports the in situ application, for the first time, of simultaneous multispecies, multipoint near-infrared diode laser absorption spectroscopy (NIRDLAS) to the deposition of thin films by atmospheric pressure chemical vapour deposition (APCVD). Hydrogen fluoride as a precursor and hydrogen chloride as a reaction product were detected in tin oxide thin film deposition in a roll-to-roll pilot reactor. The process is commercially important, and we demonstrate results from the application of the technology to the production scale manufacturing process for photovoltaic coatings.